(TiZr)N Hard Film Deposition Process Research

This paper mainly studies the fluctuation range and influence of the deposition process of (TiZr)N hard film. The effects of process parameters such as cathode target current and N2 gas flow rate on the structure and performance of the film were investigated. Studies have shown that fluctuations in deposition process parameters will not have a significant impact on the film structure and mechanical properties. The deposition process parameters of the (TiZr)N hard film can have a large fluctuation range, and the deposition process window has good applicability.

(TiZr)N hard film is a hard reaction film that is significantly better than TiN in terms of hardness, red hardness and other properties. In recent years, it has attracted extensive research interest at home and abroad. These studies mainly focus on Ti\Zr composition ratio, preparation method, organization structure and so on. However, there are few studies on the adaptability of the deposition process, and the (TiZr)N hard film has not been widely used in practical applications. As a hard film layer, the adaptability of its deposition process, or the deposition process window, has practical significance that cannot be ignored for its application on coated tools and coated molds. Therefore, this article conducts a study on the process adaptability of two (TiZr)N hard films with relatively different composition ratios in order to determine the adaptability of the (TiZr)N hard film deposition process.

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(TiZr)N hard film is prepared by multi-arc ion plating technology. Two arc sources with different orientations and configured at 90 degrees are used for simultaneous arc deposition. One arc source is a commercial pure titanium target or pure zirconium target with a purity of 99.9%; the other arc source is a commercial titanium-zirconium alloy target with a purity of 99.9% , The atomic ratio of the titanium zirconium alloy target is Ti:Zr=50:50. The polished high speed steel block is used as the substrate. Before the formal deposition of the (TiZr)N hard film, perform ion bombardment cleaning, that is, when the vacuum degree of the back of the coating chamber reaches 8.0×10-3 Pa and the temperature reaches 200℃, argon gas is filled to make the vacuum degree of the coating chamber Reach 2.5×10-1 Pa, turn on the two arc sources, keep the arc current at 55~56A, carry out ion bombardment for 10~12min, and gradually increase the bombardment bias from 350V to 400V; after bombardment cleaning, the metal transition layer is deposited, namely Keep the argon pressure in the coating chamber at 2.0×10-1 Pa, the arc current of the titanium target, zirconium target, and titanium-zirconium alloy target are all set at 55 A~60 A, and the workpiece bias voltage is 190 V~200 V , The deposition time is 5min. Then, the (TiZr)N hard film is deposited, and the deposition bias is selected as 160±2V. The specific deposition process of (TiZr)N hard film is shown in Table 1.

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(TiZr)N hard film surface morphology, fracture morphology and film composition are analyzed by HITACHIS-3400N scanning electron microscope (energy spectrum); the film phase structure is determined by X-ray diffractometer combined with Jade 6.5 electronic PDF card . The surface hardness test adopts HXD-1000TMB/LCD LCD screen display automatic turret micro hardness tester, the load is 10gf, and the load holding time is 20s. Adhesion and friction coefficient are tested with a multifunctional material surface performance tester (MFT-4000).

In the process of depositing (TiZr)N hard film with a combination of Zr target and Ti target or a combination of Zr target and Ti-Zr target, the limited fluctuation of the process parameters such as cathode arc current and N2 flow rate will not affect (TiZr)N hard film. The film surface composition, film structure, and mechanical properties have obvious effects. The prepared (TiZr)N hard film has the characteristics of high hardness, strong adhesion, and low friction coefficient. The deposition process window has good applicability.

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Founded in 2015,Zunhua Baorui Titanium Equipment Co.,Ltd. is a manufacturer specializing in pvd vacuum ion coating equipment. The company’s products mainly include large plate coating machine, large tube collating machine, tool coating machine and LOW-E glass production line. Mr.Wang baijiang ,general manager of the company ,has been engaged in vacuum coating industry for more than 30 years. He continuously improve production technology, improve product performance and devote himself to provide customers with better product experience and higher production efficiency.