PVD equipment: preparation and mechanical properties of nano-composite films

Titanium-based coatings such as TiN, TiAlN, and TiC have been widely used as cutting tools in the field of cutting tools. insufficient. In recent years, some researchers have added Si to this type of films to make TiSiN nanocomposite films, which have a hardness of more than 40 GPa and an oxidation temperature of 900 ~ 1000 ° C. Therefore, research on TiSiN nanocomposite films has attracted much attention .

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There are many methods for preparing TiSiN nanocomposite thin films, such as chemical vapor deposition, magnetron sputtering, ion beam sputtering, cathodic arc ion plating, etc., and the physical vapor deposition temperature is lower (300 ~ 400 ℃), and it is avoided The use of hazardous gases is more convenient for industrial applications. Among them, the plasma generated by cathodic arc ion plating has the characteristics of high ionization rate and high ion energy, which is more conducive to improving the compactness and binding force of the coating.

There are many methods for preparing TiSiN nanocomposite thin films, such as chemical vapor deposition, magnetron sputtering, ion beam sputtering, cathodic arc ion plating, etc., and the physical vapor deposition temperature is lower (300 ~ 400 ℃), and it is avoided The use of hazardous gases is more convenient for industrial applications. Among them, the plasma generated by cathodic arc ion plating has the characteristics of high ionization rate and high ion energy, which is more conducive to improving the compactness and binding force of the coating.

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Aiming at the poor conductivity and thermal expansion of silicon targets, which are not easy to be used as cathode arc targets, BENDAVID and other groups made various attempts. First, Ti / Si alloy targets were used, but their fixed proportions reduced the controllability of the film composition. In combination with CVD, a silane gas is provided to provide a silicon source, and a Ti cathode arc provides Ti ions. At the same time, BENDAVID et al. And KIM et al. Adopted a method of combining a magnetron sputtering silicon target with a Ti cathode arc. Both of these methods produced ultra-hard nanocomposite films with controlled composition, and studied the effects of parameters on the composition, microstructure and hardness of the film. Recently, a new technology has been used to prepare TiSiN films by combining ion beam sputtering with a cathode arc with a 90 ° magnetic filter elbow. Ti ions were provided by a magnetically filtered Ti cathode arc, and an αSi3N4 target was sputtered by ion beam to provide a Si source. The 90 ° magnetic filtering elbow of the cathode arc can filter out the micron-sized particles produced by the cathode arc, making the film smoother and denser. Si is doped in the form of Si3N4, which avoids the inadequate nitriding of Si.