Vacuum coating equipment evaporation plating principle
Reviewing the origin of the evaporation coating method: In 1960, Hoff Hof proposed the use of this aspect. The principle is to use a sealed device to heat the clean coffin to a temperature above the evaporation temperature, and evenly in a vacuum environment. The process of depositing on the surface of the product to meet predetermined requirements. During the evaporation process, the evaporation speed and current can be changed according to the required process requirements.
The vacuum evaporation coating needs to go through the following processes from the beginning to the end:
1. Using a large current to generate a high thermal energy melting film to sublimate or evaporate into gaseous particles with energy;
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2. The sublimated or evaporated energy particles leave the film and are transported to the product to be plated;
3. The energy particles after reaching the product to be plated condense on the surface of the product and solidify into a film;
Film atom recombination completes the film.
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Vacuum coating equipment evaporation plating principle knowledge points:
When the membrane is heated to a certain temperature (different melting points of different membranes, different temperatures are required), gasification can occur. In a vacuum environment, the evaporation of the material is much better than that under normal pressure, which reduces the evaporation process and improves the process. The efficiency of evaporation. Note that the cleaning of the product can improve the adhesion of the evaporation film.
Melting of some materials and evaporation temperature (degrees Celsius) reference:
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Copper: Melting 660 Evaporation 1272
Silver: Melting 961 Evaporation 1027
Indium: Melting 157 Evaporation 957
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Aluminum: Melting 660 Evaporation 1272
Tin: Melting 232 Evaporation 1189
Tungsten: Melting 3373 Evaporation 3227
Related equipment: Vacuum evaporation coating equipment Vacuum coating equipment