The importance of pre-treatment of vacuum coating What are the factors that cause unevenness in magnetron sputtering vacuum coating machines?
The pre-treatment of vacuum plating is a very important step in the electroplating production line. The surface treatment of the cargo substrate directly affects the quality of the coating, so it should pay due attention to the pre-plating treatment. This article describes the various factors that influence the quality of the coating on the surface, and discusses the various fundamental ways of pre-plating treatment on the electroplating line.
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The pre-plating treatment of the plated parts is one of the most important factors in selecting the quality of the plating. In the internship production, the plating failure rate is more than 80% in the pre-treatment process, so the effect of pre-plating treatment is particularly important. The following describes the influence of the surface condition of the substrate on the plating planning and contact force.
First, the influence of the surface condition of the substrate on the plating plan
The vacuum coating layer is composed of crystals or crystal grains. The size, shape and placement of the crystals select the coating characteristics of the coating. In various plating solutions, the planning characteristics of the metal plating are also different, and the first is the formation process is different. In the initial plating, the surface of the base material mainly produces some small dots, that is, the crystal nucleus, which increases with time, the number of individual crystals increases, and is connected to each other to form a coating.
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The process of crystal nucleation growth varies depending on the characteristics of the base metal and the operating conditions. The following are the first cases. If the initial crystallization is performed, a large number of crystal nuclei are formed, and all of them continue to grow, forming a fibrous crystal and vertically placed on the surface of the cathode; if the crystal nucleus formed is somewhat grown, the following two cases occur: crystallization The core is in a single long needle-like (dendritic) method and proceeds to the anode direction and the crystal nucleus grows uniformly in all three directions. Since the rate of increase of each crystal nucleus is different, a large crystal nucleus squeezes out a small crystal nucleus. It forms an increasingly thick conical crystal.
If the crystals formed by the preliminary electroplating quickly stop growing, and new crystals are formed from the surface of these crystals, the orientation of the crystals generated in this case will be disordered, and the coating obtained in the cyanide electrolyte is This is the case. In addition to the electrolyte composition and skill conditions, the plating plan is also seriously affected by the surface condition of the base material. If there are mechanical impurities on the surface of the base material, it is harmful to the coating structure; if the non-electrolyte adheres to the base material or the plating layer, it will constitute a pit; if the electrolyte adheres to it, it will constitute nodules. These impurities are trapped in the coating and also reduce the rust resistance of the coating. If there is oil stain, scale, etc. on the surface of the base material, it is impossible to obtain a strong coating. The surface of the base material is rough and it is difficult to obtain a bright coating. Sometimes the matrix material and the structure will cause the coating to reappear and crystallize. . Therefore, the selection of the appropriate pre-treatment skills on the surface of the substrate material is of primary importance to the quality of the plating layer.
What are the factors that cause the unevenness of the magnetron sputtering vacuum coating machine?
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What are the factors that cause the unevenness of the magnetron sputtering vacuum coating machine? Those who are engaged in the vacuum coating equipment industry should know that the factors causing unevenness in the magnetron sputtering vacuum coating machine mainly include vacuum state, magnetic field and argon.
The operation of the magnetron sputtering vacuum coating machine is to bombard the target by argon ions formed by electrons bombarding argon under the vacuum state, and the target ions are deposited on the surface of the workpiece to form a film.
The vacuum state requires a pumping system for control. Each pumping port must be started at the same time and the force is the same. This can control the uniformity of pumping. If the pumping is not uniform, the pressure in the vacuum chamber cannot be uniform. The pressure has a certain influence on the movement of ions. In addition, the pumping time should be controlled. Too short will cause insufficient vacuum, but it will be too long and waste resources. However, if there is a vacuum gauge, it is not a problem to control it.
The magnetic field is orthogonal, but it is impossible to make the magnetic field strength 100% uniform. Generally, where the magnetic field is strong, the film thickness is large, and on the contrary, it is small, so the film thickness is inconsistent. However, in the production process, the unevenness of the film due to the non-uniform magnetic field is not common. Why?
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