Multi-target ion beam sputter coating machine for vacuum coating machine
The vacuum coater should be placed in a clean, dry room. The environment of the coating studio should be air-clean and air-conditioned. The room temperature is generally between 23 and 25 ° C, and the relative humidity is about 60%. If the temperature of the studio is too high, it will affect the pumping speed. If the temperature is too low, the mechanical pump will be difficult to start. Too much humidity in the room can affect the quality of the film. Since most membrane materials have different degrees of toxicity, they will be scattered in the indoor air when the bell jar is opened. Therefore, a suction device should be installed near the bell jar to remove the toxic gas and the flying air in the vacuum chamber when the bell jar is opened. Debris. The coating machine should be installed against the wall, but there should be maintenance and operation space around it, and there is a cooling water source with a water pressure of about 3 atmospheres. The anti-vibration requirements of the coating machine are not high, no special frame is needed, but it must be placed stably and there should be no vibration.
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The multi-target ion beam sputter coating machine is a modern coating equipment for the research of superconducting, diamond-like, optical, magnetic and other high-quality films and materials. The machine uses a four-target, dual ion source, ion source for the Kaufman source. The principle is that the target material is bombarded with a positive ion beam or a neutral particle having an energy of 1500 ev, and atoms and molecules on the surface of the material are sputtered from the base material and deposited on the substrate to form a film. Any material can be plated, including metals, alloys, superconductors, semiconductors, insulators, and the like. The machine adopts the ion beam sputtering technology developed in the 1980s. It uses double ion source and main gun to bombard the target. The auxiliary gun cleans the substrate before plating, enhances the activity of the substrate, and improves the bonding strength and purity. . During the deposition process, the low-energy bombardment membrane enhances the diffusion and migration of the deposited atomic surface, reduces the defects of the crystalline phase of the film, and is equipped with various functions for processing the substrate, such as heating, cooling, rotating, laser processing, masking, and the like. The extraction grid is φ25mm ion energy, and the 1500ev energy beam current is greater than 80mA.
Ion sputter coating machine
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The multi-target ion beam sputter coater system is a leader in high precision optical film deposition applications. The multi-target ion beam sputter coater is the only system currently available in the same system that interchangeably uses a planetary, simple rotary or flippable substrate device.
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